气候变化领域集成服务门户(CCPortal): Surface functionalization on nanoparticles via atomic layer deposition

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DOI	10.1016/j.scib.2020.01.016
	Surface functionalization on nanoparticles via atomic layer deposition
	Cao K.; Cai J.; Shan B.; Chen R.
发表日期	2020
ISSN	20959273
起始页码	678
结束页码	688
卷号	65 期号:8
英文摘要	As an ultrathin film preparation method, atomic layer deposition (ALD) has recently found versatile applications in fields beyond semiconductors, such as energy, environment, catalysis and so on. The design, preparation and characterization of thin film applied in the emerging fields have attracted great interests. The development of ALD technique on particles opens up a broad horizon in the advanced nanofabrication. Pioneering applications are exploring conformal coating, porous coating and selective surface modification of nanoparticles. Conformal encapsulation of particles is a major application to protect materials with ultrathin films from being eroded by the external environment while keeping the original properties of the primary particles. Porous coating has been developed to simultaneously expose the particles’ surface and provide nanopores, which is another important method that demonstrates its advantages in modification of electrode materials, catalysis and energy applications, etc. Selective ALD takes the method forward in order to precisely control the directionality of decoration sites on the particles and selectively passivate undesired facets, sites, or defects. Such methods provide practical strategies for atomic scale and precise surface functionalization on particles and greatly expand its potential applications. © 2020 Science China Press
关键词	Atomic layer deposition Conformal encapsulation Porous coating Selective decoration Surface functionalization
英文关键词	Atoms; Catalysis; Coatings; Film preparation; Nanoparticles; Ultrathin films; Conformal coatings; Electrode material; Energy applications; External environments; Porous coatings; Primary particles; Selective surface modification; Surface Functionalization; Atomic layer deposition
语种	英语
来源期刊	Science Bulletin
文献类型	期刊论文
条目标识符	http://gcip.llas.ac.cn/handle/2XKMVOVA/206995
作者单位	State Key Laboratory of Digital of Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, China; State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, China
推荐引用方式 GB/T 7714	Cao K.,Cai J.,Shan B.,et al. Surface functionalization on nanoparticles via atomic layer deposition[J],2020,65(8).
APA	Cao K.,Cai J.,Shan B.,&Chen R..(2020).Surface functionalization on nanoparticles via atomic layer deposition.Science Bulletin,65(8).
MLA	Cao K.,et al."Surface functionalization on nanoparticles via atomic layer deposition".Science Bulletin 65.8(2020).