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DOI | 10.1063/1.5043169 |
InAs QDs on (111)-faceted Si (001) hollow substrates with strong emission at 1300 nm and 1550 nm | |
Wei, Wen-Qi; Wang, Jian-Huan; Zhang, Bin; Zhang, Jie-Yin; Wang, Hai-Ling; Feng, Qi![]() | |
发表日期 | 2018 |
ISSN | 0003-6951 |
EISSN | 1077-3118 |
卷号 | 113期号:5 |
英文摘要 | Highly uniform (111)-faceted Si sawtooth with underlying hollow structures is formed by homo-epitaxy on a U-shaped patterned Si (001) substrate, With in-situ growth on such substrates by the dual chamber molecular beam epitaxy, a high-quality GaAs film is obtained. The (111)-faceted sawtooth structures are found effectively annihilating the antiphase boundaries and terminating mostly the lattice mismatch induced dislocations at the interface, while the hollow structures can effectively reduce the thermal stress. The high-quality GaAs layers on (111)-faceted hollow Si (001) arc measured with a threading dislocation density of similar to 10(6)cm(-2) via the electron channeling contrast image method. By implementing the designed structure, strong room-temperature emission of InAs/GaAs and InAs/InGaAs quantum dots (QDs) at both O-band (1300 nm) and C/L-band (1550 nm) telecommunication wavelengths are achieved on Si (001) substrates. The O-band emission of InAs/GaAs QDs on Si (001) shows similar intensity to that on the GaAs substrate. Published by AIP Publishing. |
学科领域 | Physics |
语种 | 英语 |
WOS研究方向 | Physics, Applied |
来源期刊 | APPLIED PHYSICS LETTERS
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来源机构 | 中国科学院西北生态环境资源研究院 |
文献类型 | 期刊论文 |
条目标识符 | http://gcip.llas.ac.cn/handle/2XKMVOVA/111994 |
作者单位 | Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China |
推荐引用方式 GB/T 7714 | Wei, Wen-Qi,Wang, Jian-Huan,Zhang, Bin,et al. InAs QDs on (111)-faceted Si (001) hollow substrates with strong emission at 1300 nm and 1550 nm[J]. 中国科学院西北生态环境资源研究院,2018,113(5). |
APA | Wei, Wen-Qi.,Wang, Jian-Huan.,Zhang, Bin.,Zhang, Jie-Yin.,Wang, Hai-Ling.,...&Zhang, Jian-Jun.(2018).InAs QDs on (111)-faceted Si (001) hollow substrates with strong emission at 1300 nm and 1550 nm.APPLIED PHYSICS LETTERS,113(5). |
MLA | Wei, Wen-Qi,et al."InAs QDs on (111)-faceted Si (001) hollow substrates with strong emission at 1300 nm and 1550 nm".APPLIED PHYSICS LETTERS 113.5(2018). |
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